Optical and Electrical Properties of Antimony and Fluorine Doped Tin Oxide Thin Films
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چکیده
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Optical and Electrical Properties of Nitrogen Ion Implanted Fluorine Doped Tin Oxide Films
Tin oxide films were implanted with N at various energies between 5 to 40 keV for different ion doses between 10 to 10 cm. The microstructure, optical and electrical properties of the films were investigated. From Transmission Electron Microscopy the implanted films were shown to be amorphous. The implanted thickness for the 10 keV and 40 keV were found to be 30 nm and 110 nm, respectively. The...
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ژورنال
عنوان ژورنال: Universal Journal of Physics and Application
سال: 2017
ISSN: 2331-6535,2331-6543
DOI: 10.13189/ujpa.2017.110304